Fabric for use in coverings for architectural openings

United States Patent

United States Patent	D397,571
Anthony , et al.	September 1, 1998

Claims

The ornamental design for a fabric for use in coverings for architectural openings.

Inventors:	Anthony; James M. (Denver, CO), Colson; Wendell B. (Boulder, CO)
Assignee:	Hunter Douglas Inc. (Upper Saddle River, NJ)
Appl. No.:	D/063,083
Filed:	November 26, 1996

Current U.S. Class: D6/575

Field of Search: D6/575-581 160/236,178.1,178.2,330,348,340,341,900 D5/51

References Cited

U.S. Patent Documents


D280792	October 1985	Fairbanks
D280874	October 1985	Fairbanks
D280875	October 1985	Fairbanks
2123010	July 1938	Kahn
2169873	August 1939	Clark, Jr.
2326454	August 1943	Gentile
3844330	October 1974	Hyman
3851699	December 1974	Shapiro
3946789	March 1976	Ronkholz-Tolle
4352384	October 1982	McCoy, Jr.
4434834	March 1984	Ennes
4519435	May 1985	Stier
4535828	August 1985	Brockhaus
4550038	October 1985	Becker et al.
4792427	December 1988	Reeves
4846243	July 1989	Schneider
4911220	March 1990	Hiller
4930562	June 1990	Goodman
5012552	May 1991	Wulf
5101876	April 1992	Zak
5109912	May 1992	Gary
5109913	May 1992	Kazuma
5141042	August 1992	Schwaegerle
5203394	April 1993	Hailey
5271447	December 1993	Aronovich
5297607	March 1994	Beauchamp
5358024	October 1994	Schwaegerle
5638881	June 1997	Ruggles

Foreign Patent Documents


387188	Mar., 1940	CA
2090046	Aug., 1994	CA
228937	Jul., 1987	EP
427477	May., 1991	EP
469695	May., 1992	EP
1069055	Jul., 1954	FR
837171	Jul., 1949	DE
2920323	Nov., 1980	DE
3207850	Sep., 1983	DE
3312988	Oct., 1984	DE
9001429	May., 1990	DE
5019313	Jun., 1975	JP
623832	May., 1949	GB
2275074	Aug., 1994	GB
8912415	Dec., 1989	WO

Primary Examiner: Gandy; James
Assistant Examiner: Brooks; Linda
Attorney, Agent or Firm: Dorsey & Whitney LLP

Description

FIG. 1 is an isometric view of a fabric for use in coverings for architectural openings;

FIG. 2 is an enlarged front elevation;

FIG. 3 is a rear elevation of FIG. 2;

FIG. 4 is a left side elevation as seen in FIG. 2;

FIG. 5 is a right side elevation as seen in FIG. 2;

FIG. 6 is a greatly enlarged top plan view, with the bottom plan being identical but in reverse;

FIG. 7 is an isometric of a second embodiment of the present invention;

FIG. 8 is an enlarged front elevation of FIG. 7;

FIG. 9 is a rear elevation of FIG. 8;

FIG. 10 is a left side elevation of FIG. 8, with the right side elevation being a mirror image; and,

FIG. 11 is a greatly enlarged top plan view of FIG. 7, with the bottom plan view being identical.

The pattern of criss cross lines in all of the drawing views is understood to repeat uniformly across the entire surface of the fabric for covering for architectural openings.

Previous Show 10 Next

For U.S. patent law, rules, and procedures see MPEP.

Disclaimer. Information presented on this page while believed to be reliable, is provided "as is" with no warranties of its accuracy or timeliness. For legal advice seek help of a licensed professional.